The 9850IR has a state-of the-art laser and optics design, which was developed specifically for advanced DRAM and NAND Flash applications.

The system is able to process incredibly small link pitches and can process two banks of links in parallel due to the proprietary dual-beam architecture—providing potential throughput improvements of up to 90 percent when compared with conventional laser repair systems.

The large-field 98XX platform minimizes alignment, stepping and other overhead factors that impact throughput, while auto-adjusting optics keep optical components perfectly aligned for optimal process performance and highest productivity.

ESI's 9850IR system provides industry-leading accuracy and maximum yield.