Laser Fuse Processing

ESI is pushing boundaries with semiconductor laser fuse processing. With state-of-the-art laser positioning, ESI's world-class production systems use precise laser energy to boost yields in the production of next-generation devices for DRAM, SRAM, embedded memory and other laser-fuse applications.

The result: repair costs below one half of one percent of overall die costs, the ability to shrink die geometries, and an up-to-100% increase in the number of functional devices on each wafer.

Look to ESI to deliver ultra-small spot size, ultra-throughput and ultra-yields.

Products

The Model 9820 is based on ESI’s highly successful 98XX platform, which was developed specifically for advanced DRAM, SRAM, embedded memory and other laser fuse applications.

Model 9850IR, Dual-Beam, Infrared (IR) Laser Link-Processing System with state-of the-art laser and optics design, which was developed specifically for advanced DRAM and NAND Flash applications.

Model 9830, Laser Link-Processing System The Model 9830 is based on ESI’s highly successful 98XX platform, which was developed specifically for advanced DRAM, SRAM, embedded memory and other laser fuse applications.

Model 9850TP, Dual-Beam, Tailored-Pulse Laser Link-Processing System The Model 9850TP is designed to meet the needs of an ample variety of DRAM, FLASH and embedded memory devices.

Model 9835UV, Ultraviolet (UV) Laser Link-Processing System is based on the successful 9830 platform, which was developed specifically to meet the needs of 0.09 micron and smaller design rules on DRAM, SRAM, embedded memory and other laser fuse applications.

Model 9850UV, Dual-Beam, Ultraviolet (UV) Laser Link-Processing System The 9850UV produces a 0.8-um spot size by utilizing ESI's 100-kHz UV laser and state-of the-art optics design, which was developed specifically for advanced DRAM and NAND Flash applications.